UCLA researchers have fabricated the fastest graphene transistor to date, using a new fabrication process with a nanowire as a self-aligned gate.
Self-aligned gates are a key element in modern transistors, which are semiconductor devices used to amplify and switch electronic signals. Gates are used to switch the transistor between various states, and self-aligned gates were developed to deal with problems of misalignment encountered because of the shrinking scale of electronics.
“This new strategy overcomes two limitations previously encountered in graphene transistors,” professor of chemistry and biochemistry Xiangfeng Duan said. “First, it doesn’t produce any appreciable defects in the graphene during fabrication, so the high carrier mobility is retained. Second, by using a self-aligned approach with a nanowire as the gate, the group was able to overcome alignment difficulties previously encountered and fabricate very short-channel devices with unprecedented performance.”
These advances allowed the team to demonstrate the highest speed graphene transistors to date, with a cutoff frequency up to 300 GHz — comparable to the very best transistors from high-electron mobility materials such gallium arsenide or indium phosphide.
“This new strategy overcomes two limitations previously encountered in graphene transistors,” professor of chemistry and biochemistry Xiangfeng Duan said. “First, it doesn’t produce any appreciable defects in the graphene during fabrication, so the high carrier mobility is retained. Second, by using a self-aligned approach with a nanowire as the gate, the group was able to overcome alignment difficulties previously encountered and fabricate very short-channel devices with unprecedented performance.”
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